Publicaciones
Affichage de 13191 à 13200 sur 16261
Contrôle non intrusif de la trajectoire thermique de poudres céramiques et métallo-céramiques lors d'un processus de frittage : essais de faisabilité
C. Ricard, Luc Dubois, S. Vaucher, S. Leparoux, J.C. Camart, J. Pribetich
Actes des 4èmes Journées Franco-Maghrébines des Microondes et leurs Applications, 2005, Rabat, Maroc. ⟨hal-00126733⟩
Effect of the GaN buffer on short channel effects in AlGaN/GaN HFETs
M.J. Uren, K.J. Nash, J.L. Glasper, R.S. Balmer, T. Martin, E. Morvan, N. Caillas, S.L. Delage, D. Ducatteau, B. Grimbert, Jean-Claude de Jaeger
29th Workshop on Compound Semiconductor Devices and Integrated Circuits, WOCSDICE 2005, 2005, Cardiff, United Kingdom. ⟨hal-00126468⟩
Multi-user Ultra Wide Band communication system based on modified Gegenbauer and Hermite functions
F. Elbahhar, Atika Rivenq, Jean-Michel Rouvaen
Wireless Personal Communications, 2005, 34, pp.255-277. ⟨hal-00126480⟩
QoS optimization of MPEG-2 video transmission over ADSL channels using hierarchical modulations
C. Goudemand, François-Xavier Coudoux, Marc G. Gazalet, Patrick Corlay
2005, pp.80-84. ⟨hal-00126482⟩
Electrostatic actuators operating in liquid environment : position control without pull-in effect
A.S. Rollier, Bernard Legrand, D. Collard, L. Buchaillot
2005, pp.341-346. ⟨hal-00128651⟩
Pentacene bistable memory device
D. Tondelier, David Troadec, K. Lmimouni, D. Vuillaume, C. Fery, J. P. Dagois, G. Haas
8th European Conference on Molecular Electronics, ECME8, 2005, Bologna, Italy. ⟨hal-00125597⟩
Design of a travelling wave amplifier in 0.13 µm partially depleted SOI
M. Si Moussa, C. Pavageau, Francois Danneville, J. Russat, N. Fel, J.P. Raskin, D. Vanhoenaker-Janvier
Proceedings of the First Workshop of the Thematic Network on SOI Technology, Devices and Circuits, EUROSOI 2005, 2005, Granada, Spain. ⟨hal-00131109⟩
Noise in devices and circuits III - Proceedings of SPIE Vol. 5844
A.A. Balandin, Francois Danneville, M.J. Deen, D.M. Fleetwood
SPIE - The International Society for Optical Engineering, Bellingham, WA, USA, 309 p., 2005. ⟨hal-00577045⟩
In-situ infrared absorption spectroscopy of HfO2 growth by atomic layer deposition on Si(100) and Si(111)
Y. Wang, Y.J. Chabal, M.T. Ho, L.S. Wielunski, L. Goncharova, T. Gustafsson, G. Larrieu, M. Tao, M. Boleslawski, N. Moumen
Proceedings of the AVS 5th International Conference on Atomic Layer Deposition, ALD 2005, 2005, San Jose, CA, United States. ⟨hal-00139248⟩