Publicaciones
Affichage de 4071 à 4080 sur 16229
Study of Various PhotoResist for Bosch Process
Arnaud Pageau, Garrett Curley, Pascal Tilmant, Francois Vaurette, Dmitri Yarekha
Euronanolab Dry Etch Expert meeting, Dec 2019, Saclay, France. ⟨hal-03635045⟩
Serial Concatenation of Binary LDPC Codes with Iterative Decoding
Latifa Mostari, Abdelmalik Taleb-Ahmed
International Journal of Recent Engineering Science, 2019, 6 (6), pp.7-11. ⟨10.14445/23497157/IJRES-V6I6P102⟩. ⟨hal-03576562⟩
[Invited] Hydrogels and Other Ionic Conductors in ‘Piezo-Ionic’ Sensors, Actuators and Electrochemical Devices
John D.W. Madden, Yuta Dobashi, Mirza Sarwar, Dickson Yao, Saeedeh Ebrahimi Takalloo, Claire Preston, Tan Ngoc Nguyen, Justin Wyss, Bertille Dupont, Yael Petel, Carl Michal, Cedric Plesse, Giao Tran-Minh Nguyen, Frederic Vidal, Eric Cattan, Sébastien Grondel, David Shepherd, Geoffrey Spinks
Materials Research Society Meeting, MRS Fall 2019, Dec 2019, Boston, United States. ⟨hal-03629635⟩
Dry etching at IEMN
Dmitri Yarekha
Euronanolab Dry Etch Expert meeting, Dec 2019, Saclay, France. 2019. ⟨hal-03635035⟩
2 W / mm power density of an AlGaN/GaN HEMT grown on free-standing GaN substrate at 40 GHz
Mohamed-Reda Irekti, Marie Lesecq, N. Defrance, Etienne Okada, Eric Frayssinet, Yvon Cordier, Jean-Guy Tartarin, Jean-Claude de Jaeger
Semiconductor Science and Technology, 2019, 34 (12), pp.12LT01. ⟨10.1088/1361-6641/ab4e74⟩. ⟨hal-02929065⟩
Stationarity analysis of V2I radio channel in a suburban environment
Marwan Yusuf, Emmeric Tanghe, Frédéric Challita, Pierre Laly, Davy Gaillot, M. Lienard, Luc Martens, Wout Joseph
IEEE Transactions on Vehicular Technology, 2019, 68 (12), pp.11532-11542. ⟨10.1109/TVT.2019.2927435⟩. ⟨hal-03133296⟩
Size and shape control of a variety of metallic nanostructures using tilted, rotating evaporation and lithographic lift-off techniques
Damien Eschimese, Francois Vaurette, David Troadec, Gaëtan Lévêque, Thierry Melin, S. Arscott
Scientific Reports, 2019, 9 (1), ⟨10.1038/s41598-019-44074-w⟩. ⟨hal-02345317⟩
Application de la gravure plasma à la réalisation des composants micronanoélectroniques à base du Si au sein de la centrale technologique de l’IEMN
Dmitri Yarekha, Garrett Curley
Euronanolab Dry Etch Expert meeting, Dec 2019, Saclay, France. ⟨hal-03635041⟩
Uprooting defects to enable high-performance III–V optoelectronic devices on silicon
Youcef A Bioud, Abderraouf A Boucherif, Maksym Myronov, Ali Soltani, Gilles Patriarche, Nadi Braidy, Mourad Jellite, Dominique A Drouin, Richard A Arès
Nature Communications, 2019, 10 (1), ⟨10.1038/s41467-019-12353-9⟩. ⟨hal-02296180⟩
Nanotechnology to improve the performances of hydrodynamic surfaces
Ali Ahmed Alshehri, Philippe Champagne, Laurent Keirsbulck, El Hadj Dogheche
Coatings, 2019, 9 (12), pp.808. ⟨10.3390/coatings9120808⟩. ⟨hal-03133311⟩