Publicaciones

Affichage de 501 à 510 sur 16095


  • Communication dans un congrès

Development of Carbon Nanotube based Waveguide and Filters in W-Band

Ankit Kumar Verma, Rongtao Jiang, Stéphane Bila, Chong Wei Tan, Jianping Zou, Amit Kumar, Guillaume Ducournau, Philippe Coquet, Beng Kang Tay, Dominique Baillargeat

Demanding data rates and increasing data consumption requires matching electronic infrastructure which poses a key challenge. One of the solution to address this is by increasing the operational frequency and using higher frequency bands. In doing so the effective active component designing at...

IEEE International Nanoelectronics Conference (INEC 2025), Jan 2025, Tamsui, Taiwan. ⟨hal-05391951⟩

  • Brevet

Device and method for continuous-time energy calculation of an analog signal

Antoine Frappe, Benoit Larras, Andreia Cathelin, Soufiane Mourrane

United States, Patent n° : US2024429934 (A1) 2024-12-26. 2024, Numéro(s) de priorité: EP20230305983 20230621 - Numéro de demande: US202418748787 20240620. ⟨hal-05156540⟩

  • Brevet

Device and method for continuous-time energy calculation of an analog signal

Antoine Frappe, Benoit Larras, Andreia Cathelin, Soufiane Mourrane

Unknown Region, Patent n° : EP4482036 (A1) 2024-12-25. 2024, Numéro(s) de priorité: EP20230305983 20230621 - Numéro de demande: EP20230305983 20230621. ⟨hal-05156511⟩

  • Article dans une revue

Exploring the impact of thermal fluctuations on continuous models of adhesion

Claudia Binetti, Andrea Cannizzo, Giuseppe Florio, Nicola M Pugno, Giuseppe Puglisi, Stefano Giordano

International Journal of Engineering Science, 2024, 208, ⟨10.1016/j.ijengsci.2024.104194⟩. ⟨hal-04862968⟩

  • Article dans une revue

Enhancing Thermoelectric Efficiency in CrSi 2 Films through Al Ion Implantation-Induced Energy Filtering

Mariana M. Timm, Hugo Bouteiller, Barbara Konrad, Erwan Oliviero, Jean-François Barbot, David Troadec, Paulo F. P. Fichtner, Nicole Fréty

This article reports the effects of Al ion implantation and thermal history on the microstructure and thermoelectric properties of amorphous CrSi<sub>2</sub> thin films. Approximately 270&nbsp;nm thick CrSi<sub>2</sub> films were produced by magnetron sputtering and...

ACS Applied Electronic Materials, 2024, 7 (1), pp.246-252. ⟨10.1021/acsaelm.4c01660⟩. ⟨hal-05086873⟩