Publicaciones

Affichage de 9631 à 9640 sur 16273


  • Communication dans un congrès

Structural and optical properties of nanodots, nanowires, and multi-quantum wells of III-nitride grown by MOVPE nano-selective area Growth

W. H. Goh, G. Patriarche, P. L. Bonanno, S. Gautier, T. Moudakir, M. Abid, G. Orsal, A.A. Sirenko, Z. H. Cai, A. Martinez, A. Ramdane, L. Le Gratiet, David Troadec, A. Soltani, A. Ougazzaden

Nanodots, nanowires, and semi-polar quantum well structures of GaN-based material have been grown by nano-selective area growth (NSAG). The growth evolution of the nanostructure has been studied. Cross-sectional transmission electron microscopy (TEM) shows that the nanostructures are free of...

ICMOVPE XV, Jun 2010, Lake Tahoe, United States. ⟨10.1016/j.jcrysgro.2010.08.053⟩. ⟨hal-00554340⟩

  • Communication dans un congrès

Bubble size distributions for a stationary ultrasonic field in water and SDS solutions

Stéphane S. Labouret, Jacques J. Frohly

  • Poster de conférence

Study of the sonochemical activity in a stationary ultrasonic wave at 1 MHz in chopped mode

Stéphane S. Labouret, Jacques J. Frohly

  • Communication dans un congrès

MEMS advances and GaN based approaches

Marc Faucher, Virginie Brandli, Bertrand Grimbert, Achraf Ben Amar, Matthieu Werquin, Christophe Gaquière, Didier Theron, Lionel Buchaillot

34th Workshop on Compound Semiconductor Devices and Integrated Circuits in Europe, WOCSDICE 2010, May 2010, Darmstadt, Germany. ⟨hal-00808201⟩

  • Article dans une revue

100 nm period grating by high-index phase-mask immersion lithography

Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Anne Talneau, Svetlen Tonchev, Colette Veillas, P. Karvinen, Nicolas Passilly, Ahmad Md Zain, R.M. de La Rue, Jurgen van Erps, David Troadec

The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication,...

Optics Express, 2010, 18 (10), pp.10557-10566. ⟨10.1364/OE.18.010557⟩. ⟨ujm-00481902⟩