Publications

Affichage de 13351 à 13360 sur 16432


  • Article dans une revue

A polysilicon nanoelectrospray-mass spectrometry source based on a microfluidic capillary slot

S. Arscott, S. Le Gac, C. Rolando

Sensors and Actuators B: Chemical, 2005, 106, pp.741-749. ⟨hal-00128654⟩

  • Communication dans un congrès

Growth of silicon nanowires over Au nanoparticles supported on high surface oxide substrates

D. Bahloul-Hourlier, D. Luxembourg, D. Stievenard, P. Marecot, A. Addad, E. Payen

NSF-CNRS-IFP Workshop - Future directions in catalysis : nanostructured catalysts, 2005, Lyon, France. ⟨hal-00247493⟩

  • Communication dans un congrès

Theory of one-dimensional acoustic wave phase conjugation

A. Merlen, Q. Zhang

IEEE International Ultrasonics Symposium, 2005, Netherlands. pp.2097-2099. ⟨hal-00247436⟩

  • Communication dans un congrès

Power line communication, application to indoor and in-vehicule data transmission

Virginie Degardin, M. Olivas-Carrion, Pierre Laly, M. Lienard, Pierre Degauque

Proceedings of Cost 286 Meeting, 2005, Split, Croatia. ⟨hal-00140804⟩

  • Communication dans un congrès

Ultrasonic evaluation of residual stress in flat glass tempering by an original double interferometric detection

D. Devos, Marc Duquennoy, E. Romero, Frédéric Jenot, Dominique Lochegnies, Mohammadi Ouaftouh, Mohamed Ourak

Proceedings of the 2005 Joint World Congress on Ultrasonics/Ultrasonics International, WCU/UI'05, 2005, Beijing, China. ⟨hal-00140793⟩

  • Communication dans un congrès

Magneto-optical study TbCo/FeCo nanostructured thin films

A. Klimov, S. Masson, Vladimir Preobrazhensky, Philippe Pernod, Nicolas Tiercelin

Proceedings of the 2005 International Conference on Functional Materials, ICFM'2005, 2005, Crimea, Ukraine. ⟨hal-00138854⟩

  • Communication dans un congrès

An optimal high contrast e-beam lithography process for the patterning of dense fin networks

F. Fruleux, J. Penaud, Emmanuel Dubois, M. Francois, M. Muller

2005, pp.A/PII.01. ⟨hal-00138401⟩

  • Communication dans un congrès

Optimisation of HSQ e-beam lithography for the patterning of FinFET transistors

F. Fruleux, J. Penaud, Emmanuel Dubois, M. Francois, M. Muller

2005, pp.9C01. ⟨hal-00138404⟩