Publications

Affichage de 16001 à 16010 sur 16434


  • Article dans une revue

Theoretical reflexion coefficient of metal grid reflectors at a dielectric boundary

Ronan Sauleau, Daniel Thouroude, Philippe Coquet, J.P. Daniel

International Journal of Infrared and Millimeter Waves, 1999, 20 (2), 325-340 - 16 p. ⟨hal-00557636⟩

  • Article dans une revue

Experimental study of the quasi-breakdown failure mechanism in 4.5 nm-thick SiO2 oxides

D. Goguenheim, Alain Bravaix, Dominique Vuillaume, F. Mondon, Ph. Candelier, M. Jourdain, A. Meinertzhagen

In this study, we have investigated the electrical properties of the failure mode referred as quasi-breakdown or soft-breakdown in MOS capacitors on p-type substrate with an oxide thickness of 4.5 nm. Quasi-breakdown appears during high field stresses as a sudden increase between two and four…

Microelectronics Reliability, 1999, Microelectronics Reliability, 39 (2), pp.165-169. ⟨10.1016/S0026-2714(98)00215-7⟩. ⟨hal-03689782⟩

  • Article dans une revue

Rapid thermal processing of lead zirconate titanate thin films on Pt–GaAs substrates based on a novel 1,1,1-tris(hydroxymethyl)ethane sol-gel route

S. Arscott, R. Miles, J. Kennedy, S. Milne

Journal of Materials Research, 1999, 14 (2), pp.494-499. ⟨10.1557/JMR.1999.0070⟩. ⟨hal-02348064⟩

  • Communication dans un congrès

High linearity of double channel GaAs PHEMT using a very high selective wet etching

X. Hue, B Boudart, Bertrand Bonte, Y. Crosnier

GAAS 99, 1999, Munich, Germany. ⟨hal-01649420⟩

  • Article dans une revue

Noise analysis in devices under nonlinear operation

A. Cappy, Francois Danneville, Gilles Dambrine, Beaudouin Tamen

Solid-State Electronics, 1999, 43 (1), pp.21-26. ⟨10.1016/S0038-1101(98)00261-5⟩. ⟨hal-03612812⟩

  • Communication dans un congrès

Very high selective wet etching application to the uniformity improvement of linear power PHEMT

X. Hue, B. Boudart, Bertrand Bonte, Y. Crosnier

23th Workshop On Compound Semiconductor Devices and Integrated Circuits (WOCSDICE), 1999, Chantilly, France. ⟨hal-01654299⟩

  • Communication dans un congrès

Nanometer scale Lithography on Silicon, Titanium and PMMA resist

Emmanuel Dubois, Jean-Luc Bubendorff

E-MRS Materials and Processes for Submicron Technologies, vol. 89, p. 1085-1089, Editors J.M. Martinez- Duart, R. Madar, R.A. Levy, 1999, 1999, Strasbourg, France. ⟨hal-04249216⟩