Publications
Affichage de 3351 à 3360 sur 16289
Asymmetric micro-supercapacitors based on electrodeposited Ruo2 and sputtered VN films
Bouchra Asbani, Kevin Robert, Pascal Roussel, Thierry Brousse, Christophe Lethien
Energy Storage Materials, 2021, 37, pp.207-214. ⟨10.1016/j.ensm.2021.02.006⟩. ⟨hal-03198793⟩
Alpha-stable model for interference in IoT networks
Laurent Clavier, Troels Pedersen, Ignacio Rodriguez Larrad, Malcolm Egan
International Conference on Antenna Measurements and Applications, CAMA 2021, Nov 2021, Antibes Juan-les-Pins, France. pp.575-578, ⟨10.1109/CAMA49227.2021.9703600⟩. ⟨hal-03582453⟩
Mm-wave through-load element for on-wafer measurement applications
Marc Margalef-Rovira, Olivier Occello, Abdelhalim Saadi, Vanessa Avramovic, Sylvie Lepilliet, Loïc Vincent, Manuel J. Barragan, Emmanuel Pistono, Sylvain Bourdel, Christophe Gaquière, Philippe Ferrari
IEEE Transactions on Circuits and Systems I: Regular Papers, 2021, 68 (8), pp.3170-3183. ⟨10.1109/TCSI.2021.3072097⟩. ⟨hal-03202213⟩
Single-pole-double-throw RF switches based on monolayer MoS<sub>2</sub>
Myungsoo Kim, Emiliano Pallecchi, Henri Happy, Deji Akinwande
Evolution of localized surface plasmon resonance made of gold nanowire chain embedded in WS2multilayers
Z. Oumekloul, Y. Achaoui, A. Mir, Abdellatif Akjouj
4th International Conference on Materials and Environmental Science, ICMES 2020, Nov 2020, Oujda, Morocco. pp.7507-7510, ⟨10.1016/j.matpr.2021.02.259⟩. ⟨hal-03362269⟩
Piezoresistance in defect-engineered silicon
Heng Li, Abel Thayil, Chris Lew, Marcel Filoche, Brett Johnson, Jeff Mccallum, S. Arscott, Alistair C. H. Rowe
Physical Review Applied, 2021, 15 (1), 014046, 9 p. ⟨10.1103/PhysRevApplied.15.014046⟩. ⟨hal-03003310⟩
Radiation environment and doses on Mars at Oxia Planum and Mawrth Vallis: support for exploration at sites with high biosignature preservation potential
F. da Pieve, G. Gronoff, J. Guo, C. J. Mertens, L. Neary, B. Gu, N. E. Koval, J. Kohanoff, A. C. Vandaele, F. Cleri
Journal of Geophysical Research. Planets, 2021, 126 (1), 20 p. ⟨10.1029/2020JE006488⟩. ⟨hal-03135961⟩
Optimization of Reactive-Ion Etching (RIE) parameters to maximize the lateral etch rate of silicon using SF6/N2 gas mixture: An alternative to etching Si in MEMS with Au components
Munique Kazar Mendes, Cécile Ghouila-Houri, Serria Hammami, Thomas Arnoult, Philippe Pernod, Abdelkrim Talbi
Materials Letters, 2021, 285, pp.129058. ⟨10.1016/j.matlet.2020.129058⟩. ⟨hal-03330078⟩
Near-field scanning millimeter-wave microscope operating inside a scanning electron microscope: towards quantitative electrical nanocharacterization
Petr Polovodov, Didier Theron, Clément Lenoir, D. Deresmes, Sophie Eliet, Christophe Boyaval, Gilles Dambrine, Kamel Haddadi
Applied Sciences, 2021, 11 (6), pp.2788. ⟨10.3390/app11062788⟩. ⟨hal-03320954v2⟩