Publications

• Article dans une revue

Simulation of chemical vapor infiltration and deposition based on 3D images : a local scale approach

W. Ros, G.L. Vignoles, C. Germain, P. Supiot, G. Kokkoris

A numerical solution for the simulation of chemical vapor infiltration (CVI) of ceramic matrix composites is presented. This computational model requires a 3D representation of the preform. Gas transport and chemical reaction are simulated by a Monte Carlo random walk technique. The developed…

Chemical Vapor Deposition, 2011, 17, pp.312-320. ⟨10.1002/cvde.201106895⟩. ⟨hal-00783489⟩

• Article dans une revue

High dilution of anionic vacancies in Sr0.8Ba0.2Fe(O,F)~2.5

M. Sturza, S. Daviero-Minaud, M. Huve, N. Renaut, Nicolas Tiercelin, O. Mentre

Inorganic Chemistry, 2011, 50, pp.12499-12507. ⟨10.1021/ic2014072⟩. ⟨hal-00783376⟩

• Communication dans un congrès

An EWOD driven millimeter-wave phase shifter using a movable ultrasoft metalized PDMS ground plane

S. Hage-Ali, Nicolas Tiercelin, F. Lapierre, Y. Orlic, M. Harnois, V. Thomy, Vladimir Preobrazhensky, Philippe Pernod, P. Coquet

16th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS'11, Jun 2011, Beijing, China. pp.522-525, ⟨10.1109/TRANSDUCERS.2011.5969671⟩. ⟨hal-00799996⟩

• Article dans une revue

Value of bioremediation for reducing the phenanthrene toxic effect on benthic communities of bacteria and free-iiving nematodes, Interet de la biorémediation dans la réduction de l'effet toxique du phénanthrène sur les communautés de bactéries et de nématodes libres benthiques

Haithem Louati, O. Ben Said, A. Soltani, Ezzedine Mahmoudi, Cristiana Cravo-Laureau, Robert Duran, O. Pringault, P. Aissa

A microcosm experiment was carried out to evaluate the impact of bioremediation of marine sediments artifïcially contaminated with phenanthrene (100 ppm) on benthic communities of bacteria and free-living nematodes from Bizerte lagoon (Tunisia). Bioremediation schemes tested included biostimulation…

Bulletin De La Société Zoologique De France, 2011, 136 (1-4), pp.131-144. ⟨hal-01631860⟩

• Article dans une revue

An overview of 60 GHz location systems operating in multipath environments

Michael Bocquet, Christophe Loyez, N. Rolland

International Journal of Microwave and Wireless Technologies, 2011, 3, pp.223-230. ⟨10.1017/S1759078711000365⟩. ⟨hal-00597098⟩

• Article dans une revue

Chemical functionalization of electrodes for detection of gaseous nerve agents with carbon nanotube field-effect transistors

M. Delalande, S. Clavaguera, M. Toure, A. Carella, S. Lenfant, D. Deresmes, D. Vuillaume, J.P. Simonato

Chemical Communications, 2011, 47, pp.6048-6050. ⟨10.1039/C1CC11517K⟩. ⟨hal-00597074⟩

• Article dans une revue

Compromising radiated emission from a power line communication cable

Virginie Degardin, Pierre Laly, M. Lienard, Pierre Degauque

Journal of Communications Software and Systems, 2011, 7, pp.16-21. ⟨hal-00597099⟩

• Communication dans un congrès

Antennes accordables en fréquence dans la bande des 60 GHz sur substrat élastomère ultrasouple

S. Hage-Ali, Nicolas Tiercelin, Philippe Coquet, Yannick Dusch, Ronan Sauleau, Vladimir Preobrazhensky, Philippe Pernod

17èmes Journées Nationales Micro-ondes, JNM 2011, 2011, Brest, France. pp.3C4, 1-4. ⟨hal-00597151⟩

• Article dans une revue

AlN/GaN heterostructures grown by metal organic vapour phase epitaxy with in situ Si3N4 passivation

K. Cheng, S. Degroote, M. Leys, F Medjdoub, J. Derluyn, B. Sijmus, Marie Germain, G. Borghs

Journal of Crystal Growth, 2011, 315, pp.204-207. ⟨10.1016/j.jcrysgro.2010.09.025⟩. ⟨hal-00572672⟩

• Article dans une revue

Controlling the transmission of ultrahigh frequency bulk acoustic waves in silicon by 45° mirrors

S. Wang, J. Gao, Julien Carlier, Pierre Campistron, Assane Ndieguene, S. Guo, Olivier Bou Matar, Dorothée Debavelaere-Callens, Bertrand Nongaillard

In this paper, we present a feasible microsystem in which the direction of localized ultrahigh frequency (∼1 GHz) bulk acoustic wave can be controlled in a silicon wafer. Deep etching technology on the silicon wafer makes it possible to achieve high aspect ratio etching patterns which can be used…

Ultrasonics, 2011, 51, pp.532-538. ⟨10.1016/j.ultras.2011.01.003⟩. ⟨hal-00574498⟩