Publications

Affichage de 6011 à 6020 sur 16549


  • Article dans une revue

Copper oxide supported on three-dimensional ammonia-doped porous reduced graphene oxide prepared through electrophoretic deposition for non-enzymatic glucose sensing

Houcem Maaoui, Santosh Singh, Florina Teodorescu, Yannick Coffinier, Alexandre Barras, Alexandr Barras, Radhouane Chtourou, Sreekumar Kurungot, Sabine Szunerits, Rabah Boukherroub

Electrochimica Acta, 2017, 224, pp.346-354. ⟨10.1016/j.electacta.2016.12.078⟩. ⟨hal-04520463⟩

  • Article dans une revue

Acknowledgement to Reviewers of Nanomaterials in 2016

S. Arscott

Nanomaterials, 2017, 7 (1), pp.14. ⟨10.3390/nano7010014⟩. ⟨hal-02345453⟩

  • Communication dans un congrès

Influence d’un stress à canal ouvert sur les signaux d’électroluminescence émis par des transistors AlInN/GaN

Fanny Berthet, Guillaume Brocero, Sebastien Petitdidier, Yannick Guhel, Philippe Eudeline, Jean Lionel Trolet, Patrick Mary, A. Vivier, Christophe Gaquière, B. Boudart

20es Journées Nationales Microondes, 2017, Saint Malo, France. ⟨hal-01652207⟩

  • Communication dans un congrès

Microstructuration of Silicon Surfaces Using Nanoporous Gold Electrodes

E Torralba, Mathieu Halbwax, T El Assimi, V. Magnin, Joseph Harari, Jean-Pierre Vilcot, Sylvain Le Gall, Raphaël Lachaume, C Cachet-Vivier, Stéphane Bastide

Etching is a key process in the fabrication of silicon (Si) microstructures that are essential for several component families used in microelectronics, photonics and photovoltaics, among others. A large variety of microstructuring technologies exists nowadays (e.g. wet/dry etchings based on photo/…

21st Topical Meeting of the International Society of Electrochemistry, ISE, Apr 2017, Szeged, Hungary. pp.31375 - 31375. ⟨hal-01537684⟩

  • Article dans une revue

A user-friendly guide to the optimum ultraviolet photolithographic exposure and greyscale dose of SU-8 photoresist on common MEMS, microsystems, and microelectronics coatings and materials

Matthieu Gaudet, S. Arscott

Analytical Methods, 2017, 9 (17), pp.2495-2504. ⟨10.1039/C7AY00564D⟩. ⟨hal-02345405⟩