Publications

• Chapitre d'ouvrage

Metal-semiconductor-metal photodetectors

Joseph Harari, Jean-Pierre Vilcot, Didier Decoster

Wiley Encyclopedia of Electrical and Electronics Engineering, Volume 12, Wiley, pp.561-577, 1999. ⟨hal-00132302⟩

• Article dans une revue

Terahertz time-domain spectroscopy of films fabricated from SU-8

S. Arscott, F. Garet, P. Mounaix, L. Duvillaret, J.-L. Coutaz, D. Lippens

Electronics Letters, 1999, 35 (3), pp.243. ⟨10.1049/el:19990146⟩. ⟨hal-02348056⟩

• Communication dans un congrès

EAO des circuits microondes en régime temporel : approche physique

Christophe Dalle, M.R. Friscourt

11èmes Journées Nationales Microondes, 1999, Arcachon, France. ⟨hal-00005311⟩

• Article dans une revue

Millimeter-wave pulsed oscillator global modeling by means of electromagnetic, thermal, electrical and carrier transport physical coupled models

Stéphane Beaussart, Oliver Perrin, Marie-Renée Friscourt, Christophe Dalle

The time domain modeling of the operation of a 94-GHz pulsed silicon IMPATT oscillator, based on a physical approach, is described in this paper. It relies on the coupling of electrical, thermal, electromagnetic, and carrier transport physical models. The model has been used to study the high-power…

IEEE Transactions on Microwave Theory and Techniques, 1999, 47, pp.929-934. ⟨10.1109/22.769328⟩. ⟨hal-00005341⟩

• Proceedings/Recueil des communications

Modeling and Optimisation of Optoelectronics devices

Joseph Harari, Vincent Magnin

The aim of this paper is to present modeling and optimisation methods to be applied in optoelectronics. We do not consider the case of laser. At first, we present the main modeling methods that we used to simulate the device optical and electrical behaviour. Secondly we tackle with the interesting…

29th European Solid-State Device Research Conference (ESSDERC'99), IEEE, 1999, 2-86332-245-1. ⟨hal-04449542⟩

• Communication dans un congrès

Nanometer scale Lithography on Silicon, Titanium and PMMA resist

Emmanuel Dubois, Jean-Luc Bubendorff

E-MRS Materials and Processes for Submicron Technologies, vol. 89, p. 1085-1089, Editors J.M. Martinez- Duart, R. Madar, R.A. Levy, 1999, 1999, Strasbourg, France. ⟨hal-04249216⟩

• Communication dans un congrès

Very high selective wet etching application to the uniformity improvement of linear power PHEMT

X. Hue, B. Boudart, Bertrand Bonte, Y. Crosnier

23th Workshop On Compound Semiconductor Devices and Integrated Circuits (WOCSDICE), 1999, Chantilly, France. ⟨hal-01654299⟩

• Communication dans un congrès

Etude du contact ohmique Ti/Al/Ni/Au sur n-GaN pour applications hyperfréquences et haute température de TECs de puissance

B. Boudart, S. Trassaert, Xavier Wallart, J.C. Pesant, L Fugère, Didier Theron, Y. Crosnier

7es Journées Nationales Microélectronique et Optoélectronique (JNMO), 1999, Egat, France. ⟨hal-01654466⟩

• Article dans une revue

High-frequency four noise parameters of silicon-on-insulator-based technology MOSFET for the design of low-noise RF integrated circuits

Gilles Dambrine, J.-P. Raskin, Francois Danneville, D. Vanhoenackel Janvier, J.-P. Colinge, A. Cappy

IEEE Transactions on Electron Devices, 1999, 46 (8), pp.1733-1741. ⟨10.1109/16.777164⟩. ⟨hal-03612809⟩

• Article dans une revue

Nanometer scale lithography on silicon, titanium and PMMA resist using scanning probe microscopy

Emmanuel Dubois, Jean-Luc Bubbendorff

Scanning tunneling microscopy (STM) and atomic force microscopy (AFM) nanolithography techniques based on local oxidation of silicon/titanium and electron beam exposure of PMMA are described. It is shown that a 10 nm resolution can routinely be achieved using tapping-mode AFM-based anodization of…

Solid-State Electronics, 1999, 43 (6), pp.1085-1089. ⟨10.1016/S0038-1101(99)00029-5⟩. ⟨hal-04246744⟩