Publications

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  • Communication dans un congrès

[Invited] Pushing the limit of lithography for patterning two-dimensional lattices in III-V semiconductor quantum wells

Nathali Alexandra Franchina Vergel, C. Post, Francois Vaurette, Yannick Lambert, Dmitri Yarekha, Christophe Coinon, G. Fleury, T.S. Kulmala, T. Xu, L. Desplanque, X. Wallart, D. Vanmaekelbergh, Christophe Delerue, B. Grandidier

Building two-dimensional lattices in semiconductor quantum-wells offers the prospect to design distinct energy-momentum dispersions, including conical intersections and nondispersive bands. Here, we compare three lithographic patterning methods, e-beam lithography, block copolymer lithography and…

5th IEEE Electron Devices Technology & Manufacturing Conference, EDTM 2021, Apr 2021, Chengdu, China. pp.1-3, ⟨10.1109/EDTM50988.2021.9420884⟩. ⟨hal-03261329⟩