Publications
Affichage de 13501 à 13510 sur 16256
Investigation of longitudinal velocity fluctuations in MOSFETs by means of ensemble Monte Carlo simulation
R. Rengel, J. Mateos, T. Gonzales, D. Pardo, Gilles Dambrine, Francois Danneville, M.J. Martin
2005, pp.497-502. ⟨hal-00125307⟩
Hydrous profile modeling in porous materials from reflection coefficient measurement at 2.45 GHz
D. Glay, T. Lasri
2005, pp.206-213. ⟨hal-00125334⟩
High mobility InAs/AlInAs metamorphic heterostructures on InP (001)
X. Wallart, J. Lastennet, F. Mollot
2005, pp.94-97. ⟨hal-00125391⟩
Role of interface on the direct tunneling and the inelastic tunneling behaviors in metal/alkylsilane/silicon junctions
D. Vuillaume, D. K. Aswal, David Guérin, S. Lenfant, C. Petit, G. Salace, J. V. Yakhmi
French-Russian workshop on nanosciences and nanotechnologies, 2005, Lille, France. ⟨hal-00125618⟩
Metamorphic growth of InAs/InAlAs heterostructures on InP(001) substrates
X. Wallart, J. Lastennet, F. Mollot
13th European Molecular Beam Epitaxy Workshop, Euro-MBE, 2005, Grindelwald, Switzerland. ⟨hal-00125392⟩
As-P interface-sensitive GaInP/GaAs structures grown in a production MBE system
S. Dhellemmes, S. Godey, A. Wilk, X. Wallart, F. Mollot
Journal of Crystal Growth, 2005, 278, pp.564-568. ⟨hal-00125361⟩
A metamorphic GaAs HEMT distributed amplifier with 50 GHz bandwidth and low noise for 40 Gbits/s photoreceiver
G. Wolf, H. Happy, S. Demichel, R. Leblanc, F. Blache, R. Lefevre, Gilles Dambrine
2005, pp.27-29. ⟨hal-00125306⟩
Low power 23 GHz and 27 GHz distributed cascode amplifiers in a standard 130 nm SOI CMOS process
C. Pavageau, A. Siligaris, L. Picheta, Francois Danneville, M. Si Moussa, J.P. Raskin, D. Vanhoenacker-Janvier, J. Russat, N. Fel
2005, pp.2243-2246. ⟨hal-00125311⟩
Comparison between carried-induced optical index, loss variations and carrier lifetime in GalnAsP/InP heterostructures for 1.55 μm DOS application
Malek Zegaoui, Didier Decoster, Joseph Harari, Jean-Pierre Vilcot, F. Mollot, V. Magnin, Jean Chazelas
Electronics Letters, 2005, 41 (10), pp.613-614. ⟨10.1049/el:20050770⟩. ⟨hal-00125658⟩
Tensile stress determination in silicon nitride membrane by AFM characterization
A.S. Rollier, Bernard Legrand, D. Deresmes, M. Lagouge, D. Collard, L. Buchaillot
2005, pp.828-831. ⟨hal-00125660⟩