Publications

Affichage de 15801 à 15810 sur 16234


  • Article dans une revue

Experimental study of the quasi-breakdown failure mechanism in 4.5 nm-thick SiO2 oxides

D. Goguenheim, Alain Bravaix, Dominique Vuillaume, F. Mondon, Ph. Candelier, M. Jourdain, A. Meinertzhagen

In this study, we have investigated the electrical properties of the failure mode referred as quasi-breakdown or soft-breakdown in MOS capacitors on p-type substrate with an oxide thickness of 4.5 nm. Quasi-breakdown appears during high field stresses as a sudden increase between two and four…

Microelectronics Reliability, 1999, Microelectronics Reliability, 39 (2), pp.165-169. ⟨10.1016/S0026-2714(98)00215-7⟩. ⟨hal-03689782⟩

  • Article dans une revue

Rapid thermal processing of lead zirconate titanate thin films on Pt–GaAs substrates based on a novel 1,1,1-tris(hydroxymethyl)ethane sol-gel route

S. Arscott, R. Miles, J. Kennedy, S. Milne

Journal of Materials Research, 1999, 14 (2), pp.494-499. ⟨10.1557/JMR.1999.0070⟩. ⟨hal-02348064⟩

  • Article dans une revue

Theoretical reflexion coefficient of metal grid reflectors at a dielectric boundary

Ronan Sauleau, Daniel Thouroude, Philippe Coquet, J.P. Daniel

International Journal of Infrared and Millimeter Waves, 1999, 20 (2), 325-340 - 16 p. ⟨hal-00557636⟩

  • Article dans une revue

Nanooxidation of silicon surfaces with a scanning probe microscope : application to the conception of new devices

Didier Stiévenard, Paul-Aymeric Fontaine, Emmanuel Dubois, B. Grandidier, Jean Philippe Nys

Condensed Matter News, 1999. ⟨hal-04249377⟩

  • Article dans une revue

Acoustic waves in finite superlattices: Influence of buffer layers

M. Hammouchi, E. El Boudouti, A. Nougaoui, B. Djafari-Rouhani, M. Lahlaouti, Abdellatif Akjouj, Leonard Dobrzynski

Physical Review B, 1999, 59 (3), pp.1999-2010. ⟨10.1103/PhysRevB.59.1999⟩. ⟨hal-04069868⟩

  • Communication dans un congrès

Nanometer scale Lithography on Silicon, Titanium and PMMA resist

Emmanuel Dubois, Jean-Luc Bubendorff

E-MRS Materials and Processes for Submicron Technologies, vol. 89, p. 1085-1089, Editors J.M. Martinez- Duart, R. Madar, R.A. Levy, 1999, 1999, Strasbourg, France. ⟨hal-04249216⟩

  • Communication dans un congrès

Etude du contact ohmique Ti/Al/Ni/Au sur n-GaN pour applications hyperfréquences et haute température de TECs de puissance

B. Boudart, S. Trassaert, Xavier Wallart, J.C. Pesant, L Fugère, Didier Theron, Y. Crosnier

7es Journées Nationales Microélectronique et Optoélectronique (JNMO), 1999, Egat, France. ⟨hal-01654466⟩