Publicaciones
Affichage de 15611 à 15620 sur 16174
Microsystèmes tridimensionnels auto-assemblés : modélisation et caractérisation mécanique
L. Buchaillot, E. Quevy, O. Millet, D. Collard
Journée 'Couplage entre Mécanique et Electricité', 2000, Cachan, France. ⟨hal-00158534⟩
Bipolar cathode transfered-electron device for millimeter wave generation
Christophe Dalle, M.R. Friscourt
Solid-State Electronics, 2000, 44, pp.79-84. ⟨hal-00158130⟩
Imaging the wave function amplitudes in cleaved semiconductor quantum boxes
B. Grandidier, Y.M. Niquet, Bernard Legrand, J.P. Nys, C. Priester, D. Stievenard, J.M. Gerard, V. Thierry-Mieg
Physical Review Letters, 2000, 85, pp.1068-1071. ⟨hal-00158644⟩
New step tunable 2-sections (FP/SG-DFB) semiconductor laser for DWDM applications
M.H. Mourad, Jean-Pierre Vilcot, D. Marcenac, Didier Decoster
1st International Conference on Laser Optics for Young Scientists, LOYS 2000, 2000, Saint Petersbourg, Russia. ⟨hal-00158624⟩
A 35 GHz vector system for nondestructive applications
D. Glay, T. Lasri, A. Mamouni, Y. Leroy
2000, pp.579-585. ⟨hal-00158146⟩
Heterostructure barrier mixers for terahertz applications
Florence Podevin, P. Mounaix, O. Vanbésien, M. Chaubet, D. Lippens
Proceedings of the 11th International Symposium on Space Terahertz Technology, 2000, Ann Arbor, MI, United States. ⟨hal-00158222⟩
Modelling of heterojunction acoustic charge transport devices
T.B. Edjeou, Tadeusz Gryba, V. Zhang, Véronique Sadaune, Jean-Etienne Lefebvre
Solid-State Electronics, 2000, 44, pp.1127-1133. ⟨hal-00157839⟩
Accurate characterization of Silicon-On-Insulator MOSFET's for the design of low voltage, low power RF integrated circuits
J.P. Raskin, R. Gillon, Gilles Dambrine, Jie Chen, D. Vanhoenacker, J.P. Colinge
Analog Integrated Circuits and Signal Processing, 2000, 25, pp.133-155. ⟨hal-00157865⟩
Détection d'objets enterrés par des techniques micro-ondes
Latifa Achrait-Furlan, T. Lasri, Ahmed Mamouni
6èmes Journées Caractérisation Microonde et Matériaux, JCMM 2000, 2000, Paris, France. ⟨hal-00158163⟩
A low dielectric film obtained by polymerisation of tetramethyldisiloxane using a remote plasma enhanced chemical vapor deposition (RPECVD) process
E. Vestiel, J. Vindevoghel, D. Glay, C.E. Jama, O. Dessaux, P. Goudmand, J.L. Miane
2000, 4 pp. ⟨hal-00158145⟩