Publicaciones

Affichage de 15921 à 15930 sur 16064


  • Communication dans un congrès

Adaptive Mesh Refinement For Multilayer Process Simulation

B. Baccus, D. Collard, Emmanuel Dubois

NUPAD III: Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits, Jun 1990, Honolulu, United States. pp.87-88, ⟨10.1109/NUPAD.1990.748290⟩. ⟨hal-04248241⟩

  • Article dans une revue

Dynamics of thin epitaxial layers on (001) surfaces of bcc metals: A Green-function approach

P. Zieliński, Leonard Dobrzynski

Physical Review B, 1990, 41 (15), pp.10377-10386. ⟨10.1103/PhysRevB.41.10377⟩. ⟨hal-04070516⟩

  • Article dans une revue

Interfacial traps in Ga 0.47 In 0.53 As/InP heterostructures

Pierre Dansas, Daniel Pascal, C. Bru-Chevallier, S. Laval, L. Giraudet, M. Allovon

Journal of Applied Physics, 1990, 67 (3), pp.1384-1388. ⟨hal-01977062⟩

  • Autre publication scientifique

Etude du comportement de limiteurs à diodes PIN

Christophe Dalle, P.A. Rolland, M.R. Friscourt

1990. ⟨hal-00005290⟩

  • Article dans une revue

Theory of phonons in three- and four-layer superlattices

A. Rodriguez, A. Noguera, T. Szwacka, J. Mendialdua, Leonard Dobrzynski

Physical Review B, 1989, 39 (17), pp.12568-12574. ⟨10.1103/PhysRevB.39.12568⟩. ⟨hal-04070519⟩

  • Communication dans un congrès

Accurate two-dimensional process-device simulations for the analysis of punchthrough in walled emitter bipolar transistor

Emmanuel Dubois, B. Baccus, Dominique Collard

Proc. of NASECODE VI conference, Ed. J.J.H. Miller, Boole Press, Jun 1989, Dublin, Ireland. ⟨hal-04249158⟩

  • Communication dans un congrès

Dynamic mesh refinement for multilayer process simulation

B. Baccus, Dominique Collard, Emmanuel Dubois

Digest of the software forum: Software toold for process, device and circuit modeling, Ed. W. Crans, Boole Press, Jun 1989, Zurich, Switzerland. ⟨hal-04249146⟩