Publicaciones

• COMM

(Invited) Topological States in Multi-Orbital Honeycomb Lattices of HgTe (CdTe) Quantum Dots

W. Beugeling, E. Kalesaki, C. Delerue, Y.-M. Niquet, D. Vanmaekelbergh, C. Morais Smith

228th Meeting of the Electrochemical Society, Oct 2015, Phoenix, United States. pp.81-88, ⟨10.1149/06905.0081ecst⟩. ⟨hal-02906822⟩

• ART

Kekule versus hidden superconducting order in graphene-like systems: Competition and coexistence

Flore Kunst, Christophe Delerue, Cristiane Morais Smith, Vladimir Juričić

Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2015, 92 (16), ⟨10.1103/PhysRevB.92.165423⟩. ⟨hal-02906820⟩

• ART

Lead-Free α-La2WO6 Ferroelectric Thin Films

Thomas Carlier, Marie-Hélène Chambrier, Anthony Ferri, Sonia Estradé, Jean-François Blach, Gemma Martín, Belkacem Meziane, Francesca Peiró, Pascal Roussel, Freddy Ponchel, Denis Remiens, Albert Cornet, Rachel Desfeux

(001)-Epitaxial La2WO6 (LWO) thin films are grown by pulsed laser deposition on (001)-oriented SrTiO3 (STO) substrates. The α-phase (high-temperature phase in bulk) is successfully stabilized with an orthorhombic structure (a = 16.585(1) Å, b = 5.717(2) Å, c = 8.865(5) Å). X-ray-diffraction pole-...

ACS Applied Materials & Interfaces, 2015, 7 (44), pp.24409-24418. ⟨10.1021/acsami.5b01776⟩. ⟨hal-01681467⟩

• ART

Graphene-Gold Metasurface Architectures for Ultrasensitive Plasmonic Biosensing

Shuwen Zeng, Kandammathe Valiyaveedu Sreekanth, Jingzhi Shang, Ting Yu, Chih-Kuang Chen, Feng Yin, Dominique Baillargeat, Philippe Coquet, Ho-Pui Ho, Andrei V. Kabashin, Ken-Tye Yong

Graphene-gold metasurface architectures that can provide significant gains in plasmonic detection sensitivity for trace-amount target analytes are reported. Benefiting from extreme phase singularities of reflected light induced by strong plasmon-mediated energy confinements, the metasurface...

Advanced Materials, 2015, 27 (40), pp.6163-6169. ⟨10.1002/adma.201501754⟩. ⟨hal-01418522⟩

• ART

Integrated MEMS RF Probe for SEM Station—Pad Size and Parasitic Capacitance Reduction

A. El Fellahi, Kamel Haddadi, J. Marzouk, S. Arscott, Christophe Boyaval, T. Lasri, Gilles Dambrine

IEEE Microwave and Wireless Components Letters, 2015, 25 (10), pp.693-695. ⟨10.1109/LMWC.2015.2463213⟩. ⟨hal-02345556⟩

• COMM

Temperature dependent contact and channel sheet resistance extraction of GaN HEMT.

A.K. Sahoo, N.K. Subramani, Jean-Christophe Nallatamby, N. Rolland, Raymond Quéré, F Medjdoub

INMMIC, Oct 2015, Taormina, Italy. ⟨hal-01285706⟩

• ART

High electron mobility in high-polarization sub-10 nm barrier thickness InAlGaN/GaN heterostructure

F Medjdoub, Riad Kabouche, Astrid Linge, Bertrand Grimbert, Malek Zegaoui, Piero Gamarra, Cédric Lacam, Maurice Tordjman, Marie-Antoinette Di Forte-Poisson

Applied Physics Express, 2015, 8 (10), pp.101001. ⟨10.7567/APEX.8.101001⟩. ⟨hal-03028367⟩

• COMM

40 GSPS All Optical ADC with ENOB of 6.6 using EO Polymer Optical Deflector and Spatial Quantizer

Massinissa Hadjloum, Mohammed El Gibari, Mathieu Halbwax, Jean-Pierre Vilcot, Hong Wu Li, Afshin S. Daryoush

40GSPS analog-to-digital converters (ADC) are required for realization of digital receivers up to 20GHz. An all optical ADC is presented using an optical deflector for spatial sampling. The optimized design of optical deflector is based on optical beam propagation and finite element modeling...

International Topical Meeting on Microwave Photonics, IEEE MTT-S, Oct 2015, Paphos, Cyprus. ⟨hal-01221090⟩

• COMM

Technologies additives et les nouveaux matériaux pour les antennes et les circuits en 3D

Nicolas Delhote, Stéphane Bila, Serge Verdeyme, Olivier Tantot, Dominique Baillargeat, Aurélien Perigaud, Thierry Monédière, Thierry Chartier, Didier Lippens, Yves Quéré, Cyril Luxey, Thierry Parra, Vincent Laur

Assemblée générale 2015 du DGR Ondes, Oct 2015, Lyon, France. ⟨hal-01280482⟩

• ART

Acoustic Characterization of Patterning Degradation during Wet Etching

Christophe Virgilio, Philippe Garnier, Mathieu Foucaud, Arnaud Devos, David Pinceau, Julien Carlier, Pierre Campistron, Bertrand Nongaillard, Marc Neyens, Lucile Broussous

Photoresist degradation can occur during wet etching processes due to chemicals diffusion through the polymer. The adhesion of the resist is not guaranteed anymore and damage on the resist / material interface appears. This phenomenon is usually monitored by optical methods. However, invisible...

ECS Transactions, 2015, 69 (8), pp.185-190. ⟨10.1149/06908.0185ecst⟩. ⟨hal-03560465⟩