Publications

• COMM

IEMN : a center of the french network for basic research in Micro@Nano technology

A. Cappy

Trends in NanoTechnology, TNT 2003, 2003, Salamanca, Spain. ⟨hal-00146046⟩

• ART

MBE growth of AlGaN/GaN HEMTs on resistive Si (111) substrate with RF small signal and power performances

Y. Cordier, F. Semond, P. Lorenzini, N. Grandjean, F. Natali, B. Damilano, J. Massies, Virginie Hoel, A. Minko, N. Vellas, Christophe Gaquière, Jean-Claude de Jaeger, B. Dessertenne, S. Cassette, Et Al.

Journal of Crystal Growth, 2003, 251, pp.811-815. ⟨hal-00146661⟩

• COMM

Etude physique du phénomène de claquage par avalanche dans les transistors à effet de champ

M. Elkhou, Michel Rousseau, Jean-Claude de Jaeger

2003, pp.2D-21. ⟨hal-00146663⟩

• COMM

LP-MOCVD growth of GaAlN/GaN heterostructures on silicon carbide

Marie-Antoinette Di Forte-Poisson, Maurice Tordjman, A. Romann, M. Magis, Raphaël Aubry, Sylvain Laurent Delage, J. Di Persio, B. Grimbert, Christophe Gaquière

Proceedings of the Fifth International Conference on Nitride Semiconductors, ICNS-5, 2003, Nara, Japan. ⟨hal-00146685⟩

• ART

Influence of MBE growth conditions on the quality of InAlAs/InGaAs metamorphic HEMTs on GaAs

Yvon Cordier, P. Lorenzini, Jean Michel Chauveau, D. Ferré, Ydir Androussi, J. Di Persio, Dominique Vignaud, Jean-Louis Codron

In this work, we investigate the influence of the growth temperature and the arsenic flux on the quality of InAlAs/InGaAs metamorphic HEMTs on GaAs with inverse step based InAlAs buffer layers. We show besides the temperature, how the composition modulations make the arsenic flux a critical…

Journal of Crystal Growth, 2003, 251, pp.822. ⟨10.1016/S0022-0248(02)02316-3⟩. ⟨hal-00018494⟩

• ART

Accurate modelling of large angle tilt (LATID) and pure vertical implantations : application to the simulation of n- and p-LDMOS backgates

Evelyne Lampin, Emmanuel Dubois, H. Xu, S. Bardy, F. Murray

The lateral and vertical extensions of the backgate of complementary laterally diffused metal oxide semiconductor (LDMOS) are simulated. The importance of channeling for a large-angle tilt implantation and a purely vertical (0°) implantation are studied with the atomistic simulator Crystal-TRIM.…

IEEE Transactions on Electron Devices, 2003, 50 (5), pp.1401-1404. ⟨10.1109/TED.2003.813464⟩. ⟨hal-00146392⟩

• ART

Strain determination in silicon microstructures by combined TEM/CBED, process simulation and micro-Raman spectroscopy

V. Senez, A. Armigliato, I. de Wolf, G. Carnevale, R. Balboni, S. Frabboni, A. Benedetti

Test structures consisting of shallow trench isolation (STI) structures are fabricated using advanced silicon (Si) technology. Different process parameters and geometrical features are implemented to investigate the residual mechanical stress in the structures. A technology computer aided design…

Journal of Applied Physics, 2003, 94 (9), pp.5574-5583. ⟨10.1063/1.1611287⟩. ⟨hal-00146408⟩

• COMM

Low-frequency drain noise in AlGaN/GaN HEMTs on Si substrate

N. Malbert, N. Labat, A. Curutchet, A. Touboul, Christophe Gaquière, A. Minko

2003, pp.342-349. ⟨hal-00162738⟩

• ART

Terahertz frequency generation : electronic and photonic approach

D. Lippens

La Revue de l'électricité et de l'électronique, 2003, 1, pp.25-31. ⟨hal-00162726⟩

• COMM

Noise modelling of 0.25 µm fully depleted SOI MOSFETs

G. Pailloncy, Gilles Dambrine, Francois Danneville, B. Iniguez, J.P. Raskin

2003, pp.577-580. ⟨hal-00145992⟩