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Enhancing Thermoelectric Efficiency in CrSi 2 Films through Al Ion Implantation-Induced Energy Filtering

Mariana M. Timm, Hugo Bouteiller, Barbara Konrad, Erwan Oliviero, Jean-François Barbot, David Troadec, Paulo F. P. Fichtner, Nicole Fréty

This article reports the effects of Al ion implantation and thermal history on the microstructure and thermoelectric properties of amorphous CrSi<sub>2</sub> thin films. Approximately 270&nbsp;nm thick CrSi<sub>2</sub> films were produced by magnetron sputtering and…

ACS Applied Electronic Materials, 2024, 7 (1), pp.246-252. ⟨10.1021/acsaelm.4c01660⟩. ⟨hal-05086873⟩