Publications

Affichage de 13281 à 13290 sur 16261


  • Communication dans un congrès

An optimal high contrast e-beam lithography process for the patterning of dense fin networks

F. Fruleux, J. Penaud, Emmanuel Dubois, M. Francois, M. Muller

2005, pp.A/PII.01. ⟨hal-00138401⟩

  • Communication dans un congrès

Optimisation of HSQ e-beam lithography for the patterning of FinFET transistors

F. Fruleux, J. Penaud, Emmanuel Dubois, M. Francois, M. Muller

2005, pp.9C01. ⟨hal-00138404⟩

  • Communication dans un congrès

Impact of the intrinsic parameters of the dielectric on the leakage current

G. Larrieu, M. Tao

2nd International Workshop on Advanced Gate Stack Technology, 2005, Austin, TX, United States. ⟨hal-00138407⟩

  • Communication dans un congrès

Explicit versus implicit finite-difference approximation for semiconductor device time-domain macroscopic numerical modelling on parallel computer

A. El Moussati, Christophe Dalle

Proceedings of the 15th Workshop on Modelling and Simulation of Electron Devices, 2005, Pisa, Italy. ⟨hal-00131335⟩