Publications
Affichage de 13581 à 13590 sur 16175
Multi-user Ultra Wide Band communication system based on modified Gegenbauer and Hermite functions
F. Elbahhar, Atika Rivenq, Jean-Michel Rouvaen
Wireless Personal Communications, 2005, 34, pp.255-277. ⟨hal-00126480⟩
Contribution à la modélisation de la propagation des ondes acoustiques dans des structures anisotropes piézo-électriques
L. El Maimouni
2005. ⟨hal-00138633⟩
Millimeter wave nondestructive techniques and artificial neural networks for near-field characterization of embedded defects
M. Maazi, D. Glay, T. Lasri
Proceedings of the 2nd International Conference on Electromagnetic Near-Field Characterization and Imaging, ICONIC 2005, 2005, Barcelona, Spain. ⟨hal-00131124⟩
Millimeter up-converted UWB based positioning system
Michael Bocquet, Christophe Loyez, A. Benlarbi-Delaï
Proceedings of the 2005 Smart Objects Conference and European Symposium on Ambient Intelligence, SOC-EUSAI 2005, 2005, Grenoble, France. ⟨hal-00131129⟩
Development of a miniature sensor for the temperature follow-up using microwave radiometry in chronobiology
C. Ricard, Luc Dubois, L. Beghin, Pierre-Yves Cresson, J. Pribetich
Proceedings of the 2005 Progress in Electromagnetics Research Symposium, PIERS 2005, 2005, Hangzhou, China. ⟨hal-00131116⟩
Enhanced-TDOA measurement for ad hoc networks positioning
Michael Bocquet, Christophe Loyez, A. Benlarbi-Delaï
Proceedings of the 2005 International Workshop on Wireless Ad hoc Network, IWWAN 2005, 2005, London, United Kingdom. ⟨hal-00131115⟩
Schéma électrique équivalent aux chambres réverbérantes (CRBM)
S. Bazzoli, M. Cauterman, S. Baranowski, B. Demoulin
Actes des 4èmes Journées Franco-Maghrébines des Microondes et leurs Applications, 2005, Rabat, Maroc. ⟨hal-00140805⟩
In-situ infrared absorption spectroscopy of HfO2 growth by atomic layer deposition on Si(100) and Si(111)
Y. Wang, Y.J. Chabal, M.T. Ho, L.S. Wielunski, L. Goncharova, T. Gustafsson, G. Larrieu, M. Tao, M. Boleslawski, N. Moumen
Proceedings of the AVS 5th International Conference on Atomic Layer Deposition, ALD 2005, 2005, San Jose, CA, United States. ⟨hal-00139248⟩
Interfacial layer in the high-k dielectrics : characterization and suppression
G. Larrieu, M. Tao, N. Moumen, E. Moldonado, W.P. Kirk, G. Song, W. Bai, D.L. Kwong
2005, pp.abstract 543. ⟨hal-00138406⟩
Optimisation of the parameters of an extended defects model applied to non-amorphising implants
E. Lampin, F. Cristianio, Y. Lamrani, D. Connetable
Materials Science and Engineering: B, 2005, 124-125, pp.397-400. ⟨hal-00138395⟩