Publications

Affichage de 15581 à 15590 sur 16109


  • Article dans une revue

Lamb wave and plate mode in ZnO/silicon and AlN/silicon membrane - Application to sensors able to operate in contact with liquid

T. Laurent, F.O. Bastien, J.C. Pommier, A. Cachard, Denis Remiens, Eric Cattan

Sensors and Actuators A: Physical , 2000, 87, pp.26-37. ⟨hal-00158554⟩

  • Communication dans un congrès

Harmonic C-scan imaging by means of nonlinear finite amplitude phase conjugate ultrasonic waves

Y. Pyl'Nov, Philippe Pernod, Vladimir Preobrazhensky

2000, pp.835-838. ⟨hal-00158462⟩

  • Communication dans un congrès

Nature of impurity states in amorphous silicon

Guy Allan, Christophe Delerue, Michel Lannoo

CECAM Workshop on Electronic and Optical Properties of Semiconducting Glasses, 2000, Lyon, France. ⟨hal-00158966⟩

  • Communication dans un congrès

From porous silicon to semiconductor quantum dots

Guy Allan, Christophe Delerue, Michel Lannoo

Zhong Guan Cun for Condensed Matter Physics, 2000, Beijing, China. ⟨hal-00158971⟩

  • Article dans une revue

Modelling of heterojunction acoustic charge transport devices

T.B. Edjeou, Tadeusz Gryba, V. Zhang, Véronique Sadaune, Jean-Etienne Lefebvre

Solid-State Electronics, 2000, 44, pp.1127-1133. ⟨hal-00157839⟩

  • Article dans une revue

Space lateral transfer and negative differential conductance regimes in quantum wave guide junctions

E. Polizzi, N. Ben Abdallah, O. Vanbesien, D. Lippens

Journal of Applied Physics, 2000, 87, pp.8700-8706. ⟨hal-00158199⟩

  • Communication dans un congrès

Numerical modeling of shape memory alloy nonlinear behaviour laws : application to an adaptative structure

Anne-Christine Hladky, S. Rafanomezantsoa, L. Buchaillot

ATILA Workshop, 2000, University Park, United States. ⟨hal-00157841⟩

  • Communication dans un congrès

Heterostructure barrier mixers for terahertz applications

Florence Podevin, P. Mounaix, O. Vanbésien, M. Chaubet, D. Lippens

Proceedings of the 11th International Symposium on Space Terahertz Technology, 2000, Ann Arbor, MI, United States. ⟨hal-00158222⟩

  • Communication dans un congrès

A low dielectric film obtained by polymerisation of tetramethyldisiloxane using a remote plasma enhanced chemical vapor deposition (RPECVD) process

E. Vestiel, J. Vindevoghel, D. Glay, C.E. Jama, O. Dessaux, P. Goudmand, J.L. Miane

2000, 4 pp. ⟨hal-00158145⟩