Publications
Affichage de 13011 à 13020 sur 16106
A Closed-Form Formulation for the Total Power Radiated by a Single-Wire Overhead Line
Andrea Cozza, Flavio G. Canavero, Bernard Démoulin
16th International Symposium on Electromagnetic Compatibility, EMC Zurich, Feb 2005, Switzerland. pp.529-534. ⟨hal-00518347⟩
11% efficiency 100 GHz InP-based heterostructure barrier varactor quintupler
T. Bryllert, A. Olsen, J. Vukusic, T.A. Emadi, M. Ingvarson, J. Stake, D. Lippens
Electronics Letters, 2005, 41 (3), pp.131-132. ⟨10.1049/el:20057633⟩. ⟨hal-00154899⟩
Nanoélectronique : un passeport pour le nanomonde
O. Vanbesien
Techniques de l'Ingénieur, TI Sciences et Techniques, Paris, France, pp.RE-32, 2005. ⟨hal-00132086⟩
Strained heteroepitaxy on nanomesas: a way toward perfect lateral organization of quantum dots
Maxime Bavencoffe, Eglantine Houdart, Catherine Priester
Journal of Crystal Growth, 2005, 275 (1-2), pp.305-316. ⟨10.1016/j.jcrysgro.2004.10.145⟩. ⟨hal-02112564⟩
Impact of plasma pre-treatment before SiNx passivation on AlGaN/GaN HFETs electrical traps
Y. Guhel, B. Boudart, N. Vellas, Christophe Gaquière, E. Delos, D. Ducatteau, Z. Bougrioua, Marie Germain
Solid-State Electronics, 2005, 49, pp.1589-1594. ⟨hal-00154914⟩
Fabrication and characterization of 100-nm In0.53Ga0.47As-In0.52Al0.48As double-gate HEMTs with two separate gate controls
Nicolas Wichmann, I. Duszynski, X. Wallart, S. Bollaert, A. Cappy
IEEE Electron Device Letters, 2005, 26, pp.601-603. ⟨hal-00154894⟩
Modal waves solved in complex wave number
Wei-Jiang Xu, Frédéric Jenot, Mohamed Ourak
2005, pp.156-163. ⟨hal-00140395⟩
Characterization and modeling of in-vehicle power line propagation channel
M. Olivas-Carrion, Virginie Degardin, M. Lienard, Pierre Degauque
Proceedings of the 5th International Conference on ITS Telecommunications, ITST 2005, 2005, Brest, France. ⟨hal-00140789⟩
Surface polarization enhancement and switching properties of small ferroelectric particles
Laurent Baudry
IMF-11, Sep 2005, Iguassu Falls, Brazil. pp.IMF-01-015, ⟨10.1080/00150190600678681⟩. ⟨hal-00131106⟩
Reactive ion etching of a 20 nanometers tungsten gate using a SF$_6$/N$_2$ chemistry and hydrogen silsesquioxane hard mask resist
G. Larrieu, Emmanuel Dubois
Journal of Vacuum Science and Technology, 2005, 23 (5), pp.2046-2050. ⟨10.1116/1.2050654⟩. ⟨hal-00125635⟩