Publications

• Communication dans un congrès

Room temperature passivation of the silicon surface by chemisorption of an organic monolayer

S. Kar, D. Vuillaume

202nd ElectroChemical Society Meeting, 2002, Salt Lake City, UT, United States. ⟨hal-00148726⟩

• Communication dans un congrès

Microwave photonic devices

Didier Decoster, V. Magnin, Jean-Pierre Vilcot, Joseph Harari

1st France-Singapore Workshop on Microwave Optoelectronics Technology, 2002, Singapore, Singapore. ⟨hal-00149650⟩

• Chapitre d'ouvrage

Growth of PbTiO3/Pb[Zr,Ti]O-3 heterostructures by sputtering on Si substrate : influence of a buffer layer on the structural and electrical properties of Pb[Zr,Ti]O-3

Denis Remiens

Pandalai S.G. Crystal growth in thin solid films - Control of epitaxy, Research Signpost, Kerala, India, pp.71-86, 2002. ⟨hal-00577027⟩

• Chapitre d'ouvrage

Noise modeling and measurement techniques in deep submicron SOI devices

Francois Danneville, Gilles Dambrine

Balandin A. Noise and Fluctuations Control in Electronic Devices, American Scientific Publishers, pp.355-365, 2002. ⟨hal-00577023⟩

• Autre publication scientifique

Approche statistique en traitement du signal : application à l'imagerie radar et aux systèmes de télécommunication sans fils

Y. Delignon

2002. ⟨hal-00148626⟩

• Communication dans un congrès

Génération et détection d'impulsions électriques picosecondes à l'aide de patchs de GaAs et d'AlGaAs

L. Desplanque, Jean-Francois Lampin, F. Mollot

9èmes Journées Nationales Microélectronique et Optoélectronique, JNMO 2002, 2002, Saint-Aygulf, France. ⟨hal-00148673⟩

• Article dans une revue

Adhesive forces investigation on a silicon tip by contact mode atomic force microscope

Vincent Agache, Bernard Legrand, Dominique Collard, Lionel Buchaillot

An atomic force microscope operating in contact mode is used in this letter for probing the adhesive forces at the apex of a silicon nanotip with typical radius smaller than 15 nm, fabricated using a combination of high-resolution electron beam lithography and plasma dry etching. The amplitude of…

Applied Physics Letters, 2002, 81, pp.2623-2625. ⟨10.1063/1.1508806⟩. ⟨hal-00148768⟩

• Article dans une revue

Surface micro-machining : an overview

D. Collard, H. Fujita, H. Toshiyoshi, Bernard Legrand, L. Buchaillot

Nano et micro technologies, 2002, 2, pp.35-50. ⟨hal-00148781⟩

• Article dans une revue

Characterisation of micromachining processes during KrF excimer laser ablation of TiNi shape memory alloy thin sheets and films

S.T. Davies, E.C. Havey, H. Jin, J.P. Hayes, M.K. Ghantasala, I. Roch, L. Buchaillot

Smart Materials and Structures, 2002, 11, pp.708-714. ⟨hal-00148762⟩

• Article dans une revue

A modified bosch-type process for precise surface micromachining of polysilicon

E. Quevy, B. Parvais, J.P. Raskin, L. Buchaillot, D. Flandre, D. Collard

Journal of Micromechanics and Microengineering, 2002, 12, pp.328-333. ⟨hal-00148763⟩