Publications

• ART

Graphene growth by molecular beam epitaxy using a solid carbon source

E. Moreau, F.J. Ferrer, D. Vignaud, S. Godey, X. Wallart

The direct elaboration of graphene by molecular beam epitaxy (MBE) has been studied, using a solid carbon source. Successful growth has been achieved on both the carbon and silicon terminated faces of silicon carbide substrates in the temperature range 1000-1100 °C, as confirmed by low energy…

Physica Status Solidi A (applications and materials science), 2010, 207, pp.300-303. ⟨10.1002/pssa.200982412⟩. ⟨hal-00549551⟩

• ART

Silicon-based micromembranes with piezoelectric actuation and piezoresistive detection for sensing purposes in liquid media

Thomas Alava, Fabrice Mathieu, L. Mazenq, Caroline Soyer, Denis Remiens, Liviu Nicu

Journal of Micromechanics and Microengineering, 2010, 20, pp.075014-1-8. ⟨10.1088/0960-1317/20/7/075014⟩. ⟨hal-00549532⟩

• ART

Guided acoustic wave resonators using an acoustic Bragg mirror

I. Kone, F. Domingue, H. Jacquinot, M. Borel, M. Gorisse, A. Reinhardt, G. Parat, F. Casset, D. Pelissier-Tanon, J.F. Carpentier, L. Buchaillot, Bertrand Dubus

Lamb wave devices have recently gained an interest for providing narrow bandpass filters in wireless transmission systems. Their cointegration with film bulk acoustic wave resonators is a major advantage, enabling the possibility to provide simultaneously several radio frequency and intermediate-…

Applied Physics Letters, 2010, 96 (22), pp.223504. ⟨10.1063/1.3440370⟩. ⟨hal-00548560⟩

• ART

Fabrication of 24-MHz-disk resonators with silicon passive integration technology

M. Sworowski, F. Neuilly, Bernard Legrand, A. Summanwar, P. Philippe, L. Buchaillot

IEEE Electron Device Letters, 2010, 31, pp.23-25. ⟨10.1109/LED.2009.2034542⟩. ⟨hal-00548984⟩

• COMM

Résonateurs à ondes acoustiques guidées sur miroir de Bragg pour les communications radio-fréquences

I. Kone, F. Domingue, A. Reinhardt, F. Casset, M. Aïd, J.F. Carpentier, L. Buchaillot, Bertrand Dubus

10ème Congrés Français d'Acoustique, CFA 10, 2010, France. pp.1-4. ⟨hal-00572203⟩

• COMM

Conception and fabrication of silicon ring resonator with piezo-resistive detection for force sensing applications

Z. Xiong, B. Walter, E. Mairiaux, M. Faucher, L. Buchaillot, Bernard Legrand

5èmes Journées Nationales du GDR Micro et Nano Systèmes, 2010, Lyon, France. ⟨hal-00808200⟩

• ART

An organic nanoparticle transistor behaving as a biological spiking synapse

F. Alibart, S. Pleutin, David Guérin, C. Novembre, S. Lenfant, K. Lmimouni, C. Gamrat, D. Vuillaume

Molecule-based devices are envisioned to complement silicon devices by providing new functions or by implementing existing functions at a simpler process level and lower cost, by virtue of their self-organization capabilities. Moreover, they are not bound to von Neuman architecture and this feature…

Advanced Functional Materials, 2010, 20, pp.330-337. ⟨10.1002/adfm.200901335⟩. ⟨hal-00548959⟩

• ART

Interface engineering for improved light transmittance through photonic crystal flat lenses

Geoffroy Scherrer, Maxence Hofman, Wojciech Smigaj, B. Gralak, X. Melique, O. Vanbesien, D. Lippens, Colette Dumas, Benoît Cluzel, F. de Fornel

In this paper, we present photonic crystal flat lenses with interfaces engineered to improve the light transmittance thanks to a broad angles impedance matching. The interface engineering consists in the realization of antireflection gratings on the edges of the lenses which are designed to reduce…

Applied Physics Letters, 2010, 97 (7), pp.071119. ⟨10.1063/1.3473760⟩. ⟨hal-00548691⟩

• COMM

Experimental and theoretical comparison of the optical properties of colloidal lead salt quantum dots

Iwan Moreels, Guy Allan, Christophe Delerue, Zeger Hens

Nanoscience with Nanocrystals International Conference, NaNaX4, 2010, Munich, Germany. ⟨hal-00574397⟩

• COUV

Introduction to Schottky-barrier MOS architectures : concept, challenges, material engineering and device integration

Emmanuel Dubois, G. Larrieu, R. Valentin, N. Breil, Francois Danneville

Balestra F. Nanoscale CMOS : innovative materials, modeling and characterization, ISTE-WILEY, Chapitre 5, 157-204, 2010. ⟨hal-00575852⟩