Publications
Affichage de 13601 à 13610 sur 16059
L'électronique moléculaire
J.P. Bourgoin, M. Goffman, A. Filoramo, D. Vuillaume
LAHMANI M., DUPAS C., HOUDY P. Les nanosciences 1 - Nanotechnologies et nanophysique, Belin, Paris, France, pp.400-449, 2004. ⟨hal-00131398⟩
Measurement of low Schottky barrier heights applied to metallic source/drain metal–oxide–semiconductor field effect transistors (MOSFETs)
Emmanuel Dubois, G. Larrieu
Journal of Applied Physics, 2004, 96, pp.729-737. ⟨hal-00140973⟩
Two-photon absorption in InP substrates in the 1.55 µm range
D. Vignaud, Jean-Francois Lampin, F. Mollot
2004, pp.134-137. ⟨hal-00140715⟩
THz study of liquids using an integrated bragg filter
Jean-Francois Lampin, L. Desplanque, M. Ternisien, T. Crepin, C. Walloth, D. Lippens, F. Mollot
2004, pp.469-470. ⟨hal-00140721⟩
Caractérisation de films d'alcènes greffés sur des surfaces Si(111) par analyse XPS résolue angulairement
X. Wallart, C. Henry de Villeneuve, P. Allongue
2004, pp.152-157. ⟨hal-00140723⟩
Effects of grain boundaries, field dependent mobility and interface state traps on the characteristics of pentacene thin film transistor
A. Bolognesi, M. Berliocchi, M. Manenti, Aldo Di Carlo, Paolo Lugli, Kamal Lmimouni, Claude Dufour
IEEE Transactions on Electron Devices, 2004, 51 (12), pp.1997-2003. ⟨10.1109/TED.2004.838333⟩. ⟨hal-00140735⟩
Silicon-molecules-metal junctions by nanotransfer printing
C. Merckling, David Guérin, S. Lenfant, D. Vuillaume
French-Japan Workshop on Nanomaterials, 2004, Bordeaux, France. ⟨hal-00140758⟩
Visualization of phase conjugate ultrasound waves passed through inhomogeneous layer
K. Yamamoto, Philippe Pernod, Vladimir Preobrazhensky
Ultrasonics, 2004, 42, pp.1049-1052. ⟨hal-00140728⟩
A micro-nib nanoelectrospray source for mass spectrometry
S. Arscott, S. Le Gac, C. Druon, P. Tabourier, C. Rolando
Sensors and Actuators B: Chemical, 2004, 98 (2-3), pp.140-147. ⟨hal-00140771⟩
Self-assembled molecular diodes on silicon
S. Lenfant, C. Merckling, David Guérin, D. Vuillaume, F. Tran Van, C. Chevrot
Ultimate Lithography and Nanodevice Engineering, 2004, Agelonde, France. ⟨hal-00140751⟩